Joshua Taillon
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Leonard C. Feldman
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Characterization of the Oxide-Semiconductor Interface in 4H-SiC/SiO$\sf_2$ Structures using TEM and XPS
Systematic structural and chemical characterization of the transition layer at the interface of NO-annealed 4H-SiC/SiO$\sf_2$ metal-oxide-semiconductor field-effect transistors
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