Characterization of the Oxide-Semiconductor Interface in 4H-SiC/SiO$\sf_2$ Structures using TEM and XPS

Joshua A. Taillon, Karen Gaskell, Gang Liu, Leonard C. Feldman, Sarit Dahr, Tsvetanka S. Zheleva, Aivars J. Lelis, Lourdes G. Salamanca-Riba

Sep 23, 2015

Project Journal link PDF

Type

Conference paper

Publication

Microscopy and Microanalysis

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