Systematic Characterization of the SiC/SiO$_\sf{2}$ Transition Layer in NO-Annealed MOSFETs

Name: Systematic Characterization of the SiC/SiO$_\sf{2}$ Transition Layer in NO-Annealed MOSFETs
Start: 2012-08-16T00:00:00Z
Location: College Park, MD

Project Slides

Date

Aug 16, 2012

Event

7^th Annual SiC MOS Workshop

Location

College Park, MD

Joshua Taillon

Materials Data Scientist

A materials research scientist at NIST interested in scientific data curation, AI for materials research, and baking bread.