Joshua Taillon
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Three Dimensional Microstructural Characterization of Cathode Degradation in SOFCs Using Focused Ion Beam and SEM
Project
Slides
Date
May 13, 2014
Event
2014 Spring Electrochemical Society Meeting
Location
Orlando, FL
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Characterization of the Oxide-Semiconductor Interface in NO, P, and N-plasma Passivated 4H-SiC/SiO$_\sf{2}$ Structures Using TEM and XPS
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Characterization of the Oxide-Semiconductor Interface in 4H-SiC/SiO$_\sf{2}$ Structures Using TEM and XPS
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