Characterization of the Oxide-Semiconductor Interface in 4H-SiC/SiO$_\sf{2}$ Structures Using TEM and XPS

Name: Characterization of the Oxide-Semiconductor Interface in 4H-SiC/SiO$_\sf{2}$ Structures Using TEM and XPS
Start: 2015-08-05T00:00:00Z
Location: Portland, OR

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