Revealing Hidden Interfacial States in NO Passivated 4H-SiC/SiO$_\sf{2}$ Structures using TEM-EELS and XPS

Name: Revealing Hidden Interfacial States in NO Passivated 4H-SiC/SiO$_\sf{2}$ Structures using TEM-EELS and XPS
Start: 2016-03-18T00:00:00Z
Location: Baltimore, MD

Project PDF Slides

Date

Mar 18, 2016

Event

2016 March American Physical Society Meeting

Location

Baltimore, MD

Joshua Taillon

Materials Data Scientist

A materials research scientist at NIST interested in scientific data curation, AI for materials research, and baking bread.