TEM-EELS Investigation of Boron and Phosphorus Passivated 4H-SiC/SiO$_\sf{2}$ Interface Structures

Name: TEM-EELS Investigation of Boron and Phosphorus Passivated 4H-SiC/SiO$_\sf{2}$ Interface Structures
Start: 2017-03-15T00:00:00Z
Location: New Orleans, LA

Project PDF

Date

Mar 15, 2017

Event

2017 March American Physical Society Meeting

Location

New Orleans, LA

Joshua Taillon

Materials Data Scientist

A materials research scientist at NIST interested in scientific data curation, AI for materials research, and baking bread.